(MENAFN- JCN NewsWire) Hitachi High-Tech Launches DCR Etch System 9060 Series, Supporting Isotropic Etching of Advanced 3D Devices at the Atomic Level TOKYO, Nov 28, 2024 - (JCN Newswire) - Hitachi ...

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

The semiconductor industry is developing the next wave of applications for atomic layer etch (ALE), hoping to get a foothold in some new and emerging markets. ALE, a next-generation etch technology ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

This release is available in German. They see more than the naked eye and could make traffic safer: miniaturized thermal imaging sensors. But they are difficult to manufacture on a commercial scale.

TOKYO, Nov 28, 2024 - (JCN Newswire) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its DCR(1) Etch System 9060Series. This system, which leverages Hitachi ...