Growth temperature is a critical parameter determining the sheet carrier density of scandium aluminum nitride (ScAlN)-based heterostructures, grown using the sputtering technique. Gallium nitride (GaN ...
A research team from the Indian Institute of Technology Bombay has demonstrated an atomic layer deposition (ALD) method within a lower temperature process to apply a buffering layer of tin oxide (SnOx ...
Definition: Physical Vapor Deposition (PVD) is a sophisticated coating technology widely used to deposit thin films of materials onto various substrates. This technique involves the physical ...
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